Process Monitors

Process Monitoring with Mass Spectrometry/Residual Gas Analyzers

MKS Process Monitor products are innovative in-situ process monitoring instruments that are fully integrated, application-specific packages, including component residual gas analyzers (RGAs), analytical equipment, and control software. Process mass spectrometers are used in varied applications, including; Semiconductor, Thin Film (CVD, Etch, PVD and degas), pharmaceutical lyophylization and bulk gas purity monitoring.

Each system is specifically designed to monitor, alarm and help control the conditions found within these applications:

Vision 2000-B™ Vacuum Baseline Monitor RGA - monitors vacuum pump down, baseline, and leak back conditions on manufacturing tools (up to 7.6e-5 Torr maximum operating pressure)
Vision 2000-C™ & Vision 2000-E™ and Vision 2000-C™ XD & Vision 2000-E™ XD High Sensitivity RGAs - multiple pressure monitoring of gas species during etch, CVD and ALD processes (up to 1e-3 Torr maximum operating pressure).
Vision 2000-P™ and Vision 2000-P™ XD High Sensitivity Process Monitor RGAs - select pressure monitoring for contamination levels e.g. during the PVD process (up to 7.6e-3 Torr maximum operating pressure)
300mm Resist-Torr® and 300mm Resist-Torr® XD High Sensitivity RGAs - detection of photoresist contamination during high pressure (~8 Torr maximum operating pressure) degas
HPQ3 & HPQ3S High Pressure RGAs - high pressure (up to 1e-3 Torr and 8e-3 Torr maximum operating pressure respectively) monitoring of inert gases including; process and pump down monitoring, leak detection, vacuum diagnostics and rate of rise

For the most demanding applications where optimum sensitivity and reproducibility is required the process mass spectrometry range is available with V-lens™ patented technology (Vision 2000-C XD, Vision 2000-E XD, Vision 2000-P XD) which allows for a significantly reduced background noise and enhanced sensitivity.

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